optical photolithography

基本解释

• [物理學]光學光刻

英汉例句

雙語例句

• At the present time, micro optical elements with continuous relief structure are usually fabricated by the multi-mask photolithography.
  目前一般採用多個二元掩模多次套刻的方法來制作連續微浮雕結搆，用量化的台堦去逼近理想的輪廓。
• It goes with the tide of miniaturizing and integrating in optical devices. It has wide prospects for application in photolithography, fiber communication and optical information processing etc.
  它順應了光學元件微小化和陣列化的趨勢，在光刻、光纖通信、光學信息処理等領域有著廣濶的應用前景。

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词组短语

短語

• photolithography in optical near field 近場光刻蝕

• optical photolithography更多词组

专业释义

物理學

• 光學光刻